Electrical and optical characteristics of ITO films by pulsed laser deposition using a 10 wt.% SnO2-doped In2O3 ceramic target

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 262-266

  Kim, Sang Hyeob ^a   Park, Nae Man ^a   Kim, Taeyoub ^a   Sung, Gunyong ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Optical transmittance; PLD; Resistivity; Transparent conducting oxide

Indexed keywords

CERAMIC MATERIALS; DEPOSITION; DIFFUSION; ENERGY GAP; FLAT PANEL DISPLAYS; OPACITY; OPTICAL PROPERTIES; OPTIMIZATION; OPTOELECTRONIC DEVICES; PHYSICAL VAPOR DEPOSITION; QUARTZ; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DOPING; THERMAL EFFECTS;

LASER PLUMES; OXYGEN PRESSURE; RESISTIVITY; TRANSPARENT CONDUCTING OXIDE;

PULSED LASER DEPOSITION;

EID: 13444309353     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.032     Document Type: Conference Paper

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