Effects of physical growth conditions on the structural and optical properties of sputtered grown thin HfO2 films

Thin Solid Films

Volumn 519, Issue 17, 2011, Pages 5820-5825

  Aygun, Gulnur ^a   Cantas, Ayten ^a   Simsek, Yilmaz ^a   Turan, Rasit ^b  

^a IZMIR INSTITUTE OF TECHNOLOGY   (Turkey)

^b MIDDLE EAST TECHNICAL UNIVERSITY   (Turkey)

Author keywords

FTIR; HfO2; Reactive DC sputtering; Spectroscopic ellipsometer; XPS depth profiling; XRD

Indexed keywords

DC SPUTTERING; FTIR; HFO2; SPECTROSCOPIC ELLIPSOMETERS; XPS DEPTH PROFILING; XRD;

ATOMIC SPECTROSCOPY; CHEMICAL BONDS; DC POWER TRANSMISSION; DEPTH PROFILING; ELLIPSOMETRY; FOURIER TRANSFORMS; HAFNIUM; OPTICAL PROPERTIES; PHOTOELECTRON SPECTROSCOPY; SILICON; SILICON COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

HAFNIUM OXIDES;

EID: 79958011897     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.12.189     Document Type: Conference Paper

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