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Volumn 352, Issue 28-29, 2006, Pages 3134-3139

XPS study of pulsed Nd:YAG laser oxidized Si

Author keywords

Laser matter interactions; Lasers; Silicon; XPS

Indexed keywords

ANNEALING; MICROSTRUCTURE; NEODYMIUM; OXIDATION; SILICON; STOICHIOMETRY; SUBSTRATES; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33745877188     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.03.063     Document Type: Article
Times cited : (18)

References (24)
  • 1
    • 33745890503 scopus 로고    scopus 로고
    • Intern. Techn. Roadmap for Semiconduct., SIA, San Jose, CA, Available from: .


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.