Influence of deposition conditions on the microstructure of oxides thin films

Applied Surface Science

Volumn 253, Issue 21, 2007, Pages 8782-8787

  Tian, Guanglei ^a,c   Wu, Shigang ^b,c   Shu, Kangying ^a   Qin, Laishun ^a   Shao, Jianda ^c  

^a CHINA JILIANG UNIVERSITY   (China)

^b SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

^c SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Crystal structure; Nucleation; Oxides films; X ray diffraction

Indexed keywords

ELECTRON BEAMS; MICROSTRUCTURE; NUCLEATION; X RAY DIFFRACTION; ZIRCONIA;

DUAL ION BEAM SPUTTERING (DIBS); ION ASSISTED DEPOSITION (IAD); OXIDES FILMS;

THIN FILMS;

EID: 34547169406     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.04.073     Document Type: Article

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