Transparent conducting ZnO:Al, In and Sn thin films deposited by the sol-gel method

Thin Solid Films

Volumn 426, Issue 1-2, 2003, Pages 94-99

  Lee, Jin Hong ^a   Park, Byung Ok ^a  

^a Kyungpook National University   (South Korea)

Author keywords

Electrical measurements; Electrical properties; Optical properties; Sol gel method; Zinc oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; FUSED SILICA; HEAT TREATMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING; SOL-GELS; ZINC OXIDE;

GLASS SUBSTRATES;

THIN FILMS;

EID: 0037463269     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00014-2     Document Type: Article

References (22)

1. Chatelon J.P., Terrier C., Roger J.A. J. Sol-Gel Sci. Technol. 10:1997;55.
2. Adurodija F.O., Izumi H., Ishihara T., Yoshioka H., Matsui H., Motoyama M. Jpn. J. Appl. Phys. 38:1999;2710.
3. Ohyama M., Kozuka H., Yoko T. J. Am. Ceram. Soc. 81:(6):1998;1622.
4. Lee C., Lim K., Song J. Sol. Energy Mater. Sol. Cells. 43:1996;37.
5. Yamamoto Y., Saito K., Takakashi K., Konagai M. Sol. Energy Mater. Sol. Cells. 65:2001;125.
6. Sanchez-Juarez A., Tiburcio-Silver A., Oritz A., Zironi E.P., Rickards J. Thin Solid Films. 333:1998;196.
7. Abou-Helal M.O., Seeber W.T. J. Non-Cryst. Solids. 218:1997;139.
8. Natsume Y., Sakata H. Mater. Chem. Phys. 78:2002;170.
9. Lee J.-H., Ko K.-H., Park B.-O. J. Cryst. Growth. 247:2003;119.
10. Sernelius B.E., Berggren F.-K., Jin Z.-C., Hamberg I., Granqvist C.G. Phys. Rev. 37:1998;10244.
11. F. Paraguay D., J. Morales, W. Estrada L., E. Andrade, M. Miki-Yoshida, Thin Solid Films 366 (2000) 16.
12. Ohyama M., Kozuka H., Yoko T. J. Ceram. Soc. Jpn. 104:(4):1996;296.
13. Nunes P., Fortunato E., Tonello P., Braz Fernandes F., Vilarinho P., Martins R. Vacuum. 64:2002;281.
14. Shim E.S., Kang H.S., Kang J.S., Kim J.H., Lee S.Y. Appl. Surf. Sci. 186:2002;474.
15. Nunes P., Costa D., Fortunato E., Martins R. Vacuum. 64:2002;293.
16. Kashiwaba Y., Katahira F., Haga K., Sekiguchi T., Watanabe H. J. Cryst. Growth. 221:2000;431.
17. F. Paraguay D., W. Estrada L., D.R. Acosta N., E. Andrade, M. Miki-Yoshida, Thin Solid Films 350 (1999) 192.
18. Kamalasanan M.N., Chandra S. Thin Solid Films. 288:1996;112.
19. Nishino J., Ohshio S., Kamata K. J. Am. Ceram. Soc. 75:(12):1992;3469.
20. Petrov I., Orlinov V., Misiuk A. Thin Solid Films. 120:1984;55.
21. Sukkar M.H., Tuller H.L. Adv. Ceram. 7:1984;71.
22. Major S., Banerjee A., Chopra K.L. Thin Solid Films. 122:1984;31.