SCOPUS 정보 검색 플랫폼

Volumn 21, Issue 10, 2011, Pages 1770-1778

High-resolution patterning of various large-area, highly ordered structural motifs by directional photofluidization lithography: Sub-30-nm line, ellipsoid, rectangle, and circle arrays

(3) Lee, Seungwoo a,b Kang, Hong Suk a Park, Jung Ki a,b

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

b University of Illinois at Urbana Champaign (United States)

Author keywords

azopolymer; directional photofluidization; hierarchical structures; line edge roughness; polarization dependence

Indexed keywords

AZOPOLYMER; DIRECTIONAL PHOTOFLUIDIZATION; HIERARCHICAL STRUCTURES; LINE EDGE ROUGHNESS; POLARIZATION-DEPENDENCE;

NANOSTRUCTURES; POLARIZATION;

ROUGHNESS MEASUREMENT;

EID: 79956144673 PISSN: 1616301X EISSN: 16163028 Source Type: Journal
DOI: 10.1002/adfm.201001927 Document Type: Article

Times cited : (60)

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