Fabrication of ultralow-loss Si/SiO2 waveguides by roughness reduction

Optics Letters

Volumn 26, Issue 23, 2001, Pages 1888-1890

  Lee, Kevin K ^a   Lim, Desmond R ^a   Kimerling, Lionel C ^a   Shin, Jangho ^b   Cerrina, Franco ^b  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SINGLE-MODE WAVEGUIDES;

ANISOTROPY; ETCHING; OXIDATION; WAVEGUIDES;

SILICA;

EID: 0001749527     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.26.001888     Document Type: Article

References (9)

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