Sub-10 nm nanoimprint lithography by wafer bowing

Nano Letters

Volumn 8, Issue 11, 2008, Pages 3865-3869

  Wu, Wei ^a   Tong, William M ^a,b   Bartman, Jonathan ^b   Chen, Yufeng ^b   Walmsley, Robert ^a   Yu, Zhaoning ^a   Xia, Qiangfei ^a   Park, Inkyu ^a   Picciotto, Carl ^a   Gao, Jun ^a   Wang, Shin Yuan ^a   Morecroft, Deborah ^c   Yang, Joel ^c   Berggren, Karl K ^c   Williams, R Stanley ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMPRINTING MECHANISMS; LONG TERMS; LOWER COSTS; NANO IMPRINTINGS; SHORT TERMS; STEP AND REPEATS; VOLUME MANUFACTURING;

MACHINE DESIGN;

NANOIMPRINT LITHOGRAPHY;

EID: 61649094013     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl802295n     Document Type: Article

References (6)

1. Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. J. Vac. Sci. Technol., B 1996, 14, 4129.
2. Jung, G.-Y.; Johnston-Halperin, E.; Wu, W.; Yu, Z.; Wang, S.-Y.; Tong, W. M.; Li, Z.; Green, J. E.; Sheriff, B. A.; Boukai, A.; Bunimovich, Y.; Heath, J. R.; Williams, R. S. Nano Lett. 2006, 6, 351.
3. Wu, W.; Jung, G. Y.; Olynick, D. L.; Straznicky, J.; Li, Z.; Li, X.; Ohlberg, D.; Chen, Y; Wang, S. Y.; Tong, W. M.; Williams, R. S. Appl. Phys. A: Mater. Sci. Process 2005, 80, 1173.
4. Wu, W.; Kim, E.; Ponizovskaya, E.; Liu, Y.; Yu, Z.; Fang, N.; Shen, Y. R.; Bratkovsky, A. M.; Tong, W.; Sun, C.; Zhang, X.; Wang, S. Y.; Williams, R. S. Appl. Phys. A: Mater. Sci. Process. 2007, 87, 143.
5. Kim, E.; Wu, W.; Ponizovskaya, E.; Yu, Z.; Bratkovsky, A. M.; Wang, S.-Y.; Williams, R. S.; Shen, Y. R. Appl. Phys. Lett. 2007, 91, 3105.
6. Yang, J. K. W.; Berggren, K. K. J. Vac. Sci. Technol., B 2007, 25, 2025.