Confining light to deep subwavelength dimensions to enable optical nanopatterning

Science

Volumn 324, Issue 5929, 2009, Pages 917-921

  Andrew, Trisha L ^a   Tsai, Hsin Yu ^a,b   Menon, Rajesh ^a,c  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b USA   (United States)

^c LumArray Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXPERIMENTAL STUDY; WAVELENGTH;

ARTICLE; DIFFRACTION; FILM; IMAGE ANALYSIS; IRRADIATION; MOLECULE; NANOANALYSIS; OPTICAL RESOLUTION; PRIORITY JOURNAL; SPECTRAL SENSITIVITY; THERMOSTABILITY; LASER; LIGHT; METHODOLOGY; NANOTECHNOLOGY; OPTICS; PHOTOCHEMISTRY; PHOTON;

LASERS; LIGHT; NANOTECHNOLOGY; OPTICS AND PHOTONICS; PHOTOCHEMICAL PROCESSES; PHOTONS;

EID: 66149102084     PISSN: 00368075     EISSN: 10959203     Source Type: Journal    
DOI: 10.1126/science.1167704     Document Type: Article

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27. We thank F. Stellacci and T. Swager for advice on synthesis of the photochromic molecules, H. Koh for the ellipsometric measurements, T. O'Reilly for assistance with the Lloyd's-mirror interferometer, and H. Smith for suggestions on the manuscript. T.L.A. was partially funded by a subcontract (6916866) from LumArray. H.-Y.T. was partially funded by an ignition grant from the MIT Deshpande Center for Technological Innovation. R.M. was partially funded by a Defense Advanced Research Projects Agency Small Business Innovation Research award (W31P4Q-05-C-R156). Three patents have been filed through MIT based on the work presented herein.