Fabrication and application of polyimide plastic molds for nanoimprint lithography

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 10, 2010, Pages 6446-6452

  Wu, Chun Chang ^a   Hsu, Steve Lien Chung ^a   Lo, I Lin ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Antireflection coating; Efficiency; Inductively coupled plasma; Optimal design; Reflectance; Silicon nitride; Simulation; Sub wavelength structure

Indexed keywords

DIFFERENT STRUCTURE; GLASS TRANSITION TEMPERATURE; HIGH THERMAL STABILITY; HOT-EMBOSSING; NANOMETER-SCALE PATTERNS; OPTIMAL DESIGN; POLYAMIC ACIDS; REFLECTANCE; RIGID PLASTIC; SIMULATION; SUB-WAVELENGTH STRUCTURES; TENSILE MODULI; TRANSPARENT POLYIMIDES;

ANTIREFLECTION COATINGS; GLASS TRANSITION; INDUCTIVELY COUPLED PLASMA; LIGHT POLARIZATION; MOLD RELEASE AGENTS; NEMATIC LIQUID CRYSTALS; OPTIMAL SYSTEMS; OPTIMIZATION; PLASTIC COATINGS; PLASTIC MOLDS; POLYIMIDES; REFLECTION; SILICON NITRIDE; SILICON WAFERS;

NANOIMPRINT LITHOGRAPHY;

EID: 79955549199     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2618     Document Type: Article

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