On the efficiency of quantum lithography

New Journal of Physics

Volumn 13, Issue , 2011, Pages

  Kothe, Christian ^a,b   Björk, Gunnar ^a   Inoue, Shuichiro ^c   Bourennane, Mohamed ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b STOCKHOLM UNIVERSITY   (Sweden)

^c NIHON UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FEATURE RESOLUTION; FEATURE SIZES; LITHOGRAPHIC PATTERNS; QUANTUM LITHOGRAPHY; SPATIAL CORRELATIONS; THEORETICAL EXPLANATION;

EXPERIMENTS; FORECASTING; LITHOGRAPHY; MULTIPHOTON PROCESSES;

QUANTUM EFFICIENCY;

EID: 79955381508     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/13/4/043028     Document Type: Article

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