Implementation of sub-Rayleigh-resolution lithography using an N-photon absorber

Journal of Modern Optics

Volumn 53, Issue 16-17, 2006, Pages 2271-2277

  Hye, Jeong Chang ^a   Heedeuk, Shin ^a   O'Sullivan Hale, Malcolm N ^a   Boyd, Robert W ^a  

^a UNIVERSITY OF ROCHESTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXCITONS; LITHOGRAPHY; OPTICAL RESOLVING POWER; PHASE SHIFTERS; PHOTONS; POLYMETHYL METHACRYLATES; RAYLEIGH SCATTERING;

PHOTON ABSORPTION; TWO FOLD ENHANCEMENT; UV LITHOGRAPHIC MATERIAL; VISIBLE REGION;

NONLINEAR OPTICS;

EID: 33750500734     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500340600895656     Document Type: Conference Paper

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