Is entanglement dispensable in quantum lithography?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6305, Issue , 2006, Pages

  D'Angelo, Milena ^a,b   Scarcelli, Giuliano ^a,c   Shih, Yanhua ^a  

^a UNIVERSITY OF MARYLAND BALTIMORE COUNTY   (United States)

^b UNIVERSITY OF FLORENCE   (Italy)

^c MASSACHUSETTS GENERAL HOSPITAL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

QUANTUM IMAGING; QUANTUM LITHOGRAPHY; RAYLEIGH LIMIT; SPATIAL RESOLUTION;

DIFFRACTIVE OPTICS; IMAGING SYSTEMS; LIGHT INTERFERENCE; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; PHOTONS;

QUANTUM OPTICS;

EID: 33750537469     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.696336     Document Type: Conference Paper

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