SCOPUS 정보 검색 플랫폼

Optical Engineering

Volumn 41, Issue 7, 2002, Pages 1729-1732

Twofold spatial resolution enhancement by two-photon exposure of photographic film

(2) Korobkin, Dmitriy V a Yablonovitch, Eli a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

Photolithography; Two photon absorption

Indexed keywords

CAMERA LENSES; CONTINUOUS WAVE LASERS; EXPOSURE CONTROLS; FOCUSING; LASER BEAMS; LASER PULSES; LIGHT ABSORPTION; LIGHT INTERFERENCE; PHOTOGRAPHIC FILMS; PHOTOLITHOGRAPHY; PHOTONS; PHOTOSENSITIVITY;

INTERFERENCE FRINGES; LASER INTENSITY; SPATIAL RESOLUTION ENHANCEMENT; TITANIUM SAPPHIRE LASER; TWO PHOTON ABSORPTION; TWO PHOTON EXPOSURE;

IMAGE ENHANCEMENT;

EID: 0036649278 PISSN: 00913286 EISSN: None Source Type: Journal
DOI: 10.1117/1.1479706 Document Type: Article

Times cited : (23)

References (9)

1
- 12844282963
- Interferometric lithography-from periodic arrays to arbitrary patterns
- (1998) Microelectron. Eng. , vol.41-42 , pp. 145-148
- Brueck, S.R.J.¹ Zaidi, S.H.² Chen, X.³ Zhang, Z.⁴

2
- 0033464034
- Two-photon exposure of photographic film
- (1999) J. Opt. Soc. Am. B , vol.16 , pp. 605-608
- Wu, P.-W.¹ Dunn, B.² Yablonovitch, E.³ Doan, V.⁴ Schwartz, B.⁵

3
- 0030736545
- Three-dimensional micro-fabrication with two-photon-absorbed photopolymerization
- (1997) Opt. Lett. , vol.22 , pp. 132-134
- Maruo, S.¹ Nakamura, O.² Kawata, S.³

4
- 0000469932
- Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures
- (1998) Opt. Lett. , vol.23 , pp. 1745-1747
- Witzgall, G.¹ Vrijen, R.² Yablonovitch, E.³ Doan, V.⁴ Schwartz, B.J.⁵

5
- 0003082641
- Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure
- (1999) Opt. Eng. , vol.38 , pp. 334-338
- Yablonovitch, E.¹ Vrijen, R.²

6
- 0034714670
- Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit
- (2000) Phys. Rev. Lett. , vol.85 , pp. 2733-2736
- Boto, A.N.¹ Kok, P.² Abrams, D.S.³ Braunstein, S.L.⁴ Williams, C.P.⁵ Dowling, J.P.⁶

7
- 84994847774
- Kodak Commercial Film, Kodak technical data publication F-16, Eastman Kodak, Rochester, NY

8
- 0021421940
- Negative dispersion using pairs of prisms
- (1984) Opt. Lett. , vol.9 , pp. 150-152
- Fork, R.L.¹ Martinez, O.E.² Gordon, J.P.³

9
- 77957046777
- High-resolution femtosecond pulse shaping
- (1988) J. Opt. Soc. Am. B , vol.5 , pp. 1563-1572
- Weiner, A.M.¹ Heritage, J.P.² Kirschner, E.M.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.