Theoretical consideration on quantum lithography with conventional projection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1502-1508

  Fujii, Toru ^a   Fukutake, Naoki ^a   Osawa, Hisao ^a   Ooki, Hiroshi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Biphoton absorption; Double slit; Fourier plane; Image plane; Quantum lithography

Indexed keywords

DIFFRACTION; LIGHT ABSORPTION; LIGHT SOURCES; PHOTONS; PHOTORESISTS; PROJECTION SYSTEMS; QUANTUM OPTICS; QUANTUM THEORY;

BIPHOTON ABSORPTION; MASK EXPOSURE SYSTEM; QUANTUM LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0141832953     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485335     Document Type: Conference Paper

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