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Physical Review Letters

Volumn 86, Issue 20, 2001, Pages 4516-4519

Entangled-state lithography: Tailoring any pattern with a single state

(3) Björk, Gunnar a,b Sánchez Soto, Luis L a Söderholm, Jonas b

a UNIVERSIDAD COMPLUTENSE DE MADRID (Spain)

b ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DENSITY (OPTICAL); ELECTRON ENERGY LEVELS; HAMILTONIANS; IMAGE PROCESSING; LIGHT POLARIZATION; OPTICAL BEAM SPLITTERS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; PHOTONS; QUANTUM INTERFERENCE PHENOMENA;

PIXEL PATTERNS;

QUANTUM OPTICS;

EID: 0038750754 PISSN: 00319007 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevLett.86.4516 Document Type: Article

Times cited : (114)

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