Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns

Physical Review A. Atomic, Molecular, and Optical Physics

Volumn 63, Issue 6, 2001, Pages

  Kok, Pieter ^a   Boto, Agedi N ^b   Abrams, Daniel S ^b   Williams, Colin P ^b   Braunstein, Samuel L ^a   Dowling, Jonathan P ^b  

^a BANGOR UNIVERSITY   (United Kingdom)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; FOURIER TRANSFORMS; INTEGRODIFFERENTIAL EQUATIONS; INTERFEROMETRY; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; PHOTONS;

FOUR MODE ENTANGLED STATES; QUANTUM INTERFEROMETRIC OPTICAL LITHOGRAPHY; RAYLEIGH DIFFRACTION LIMIT;

QUANTUM OPTICS;

EID: 34547943619     PISSN: 10502947     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)