Quantum lithography by coherent control of classical light pulses

Optics Express

Volumn 12, Issue 26, 2004, Pages 6600-6605

  Pe'er, Avi ^a   Dayan, Barak ^a   Vucelja, Marija ^a   Silberberg, Yaron ^a   Friesem, Asher A ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; MICROSCOPIC EXAMINATION; NONLINEAR OPTICS; PHOTOLITHOGRAPHY; PHOTONS; SEMICONDUCTOR MATERIALS;

QUANTIZATION EFFECTS; QUANTUM LITHOGRAPHY; ULTRAFAST NONLINEAR OPTICS;

QUANTUM OPTICS;

EID: 11244303651     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OPEX.12.006600     Document Type: Article

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