Experimental study on nonlinear multiple-exposure method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 85-93

  Ooki, Hiroshi ^a   Coon, Derek P ^a   Owa, Soichi ^a   Sei, Toshihiko ^a   Okamoto, Kazuya ^a  

^a NIKON PRECISION INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS; PHOTOSENSITIVITY; SEMICONDUCTOR DEVICE MANUFACTURE;

NONLINEAR MULTIPLE EXPOSURE; OPTICAL MICROLITHOGRAPHY; RESOLUTION ENHANCEMENT;

PHOTOLITHOGRAPHY;

EID: 0031339499     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276012     Document Type: Conference Paper

References (9)