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Thin Solid Films

Volumn 519, Issue 11, 2011, Pages 3509-3515

Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering

(6) Vergara, L a Galindo, R Escobar a,b Martinez R c Sanchez O a Palacio, C d Albella, J M a

a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID (Spain)

b CENTRO DE MICROANÁLISIS DE MATERIALES (Spain)

c AIN (Spain)

d UNIVERSIDAD AUTÓNOMA DE MADRID (Spain)

Author keywords

Mixed oxides; Optical properties; Reactive magnetron sputtering

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHROMIUM COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MICROELECTRONICS; OPTICAL COATINGS; OPTICAL PROPERTIES; OXIDE FILMS; REACTIVE SPUTTERING; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON OXIDES; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; X RAY DIFFRACTION;

BINARY OXIDES; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; MIXED OXIDE; MIXED-OXIDE THIN FILMS; REACTIVE MAGNETRON SPUTTERING; RUTHERFORD BACK-SCATTERING SPECTROMETRY;

SILICON COMPOUNDS;

EID: 79952739672 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.103 Document Type: Article

Times cited : (8)

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