Growth and characterization of chromium oxide coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 2925-2931

  Barshilia, Harish C ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

Asymmetric bipolar pulsed DC generator; Chromium oxide; Magnetron sputtering; Structural and mechanical properties

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM ALLOYS; CHROMIUM COMPOUNDS; CORROSION RESISTANCE; CORROSION RESISTANT COATINGS; CORROSIVE EFFECTS; DC GENERATORS; FLOW RATE; HARDNESS; LOW CARBON STEEL; MAGNETRON SPUTTERING; OXYGEN; POLARIZATION; POTENTIODYNAMIC POLARIZATION; RAMAN SPECTROSCOPY; SODIUM CHLORIDE; SPECTROSCOPIC ELLIPSOMETRY; STEEL CORROSION; SUBSTRATES; X RAY DIFFRACTION;

ASYMMETRIC BIPOLAR-PULSED DC GENERATOR; CHROMIUM OXIDES; LOW SUBSTRATE TEMPERATURE; MICRO RAMAN SPECTROSCOPY; NANO-INDENTATION HARDNESS; POTENTIODYNAMIC POLARIZATION TECHNIQUE; REACTIVE UNBALANCED MAGNETRON SPUTTERING; STRUCTURAL AND MECHANICAL PROPERTIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 57049137119     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.08.057     Document Type: Article

References (41)

1. Khanna A., Bhat D.G., and Payzant E.A. J. Vac. Sci. Technol. A 24 (2006) 1870
2. Hones P., Levy F., and Randall N.X. J. Mater. Res. 14 (1999) 3623
3. Bhushan B., Theunissen G.S.A.M., and Li X. Thin Solid Films 311 (1997) 67
4. Al-Kuhaili M.F., and Durrani S.M.A. Optical Mater. 29 (2007) 709
5. Kao A.S., Doerner M.F., and Novotny V.J. J. Appl. Phys. 66 (1989) 5215
6. Figueiredo M.O., and Carmezim M.J. Pigment Resin Technol. 27 (1998) 243
7. Lai F.D., Huang C.Y., Chang C.M., Wang L.A., and Cheng W.C. Microelectron. Eng. 67-68 (2003) 17
8. Barshilia H.C., Selvakumar N., Rajam K.S., and Biswas A. J. Appl. Phys. 103 (2008) 023507
9. Hones P., Diserens M., and Levy F. Surf. Coat. Technol. 120-121 (1999) 277
10. Wang D.-Y., Lin J.-H., and Ho W.-Y. Thin Solid Films 332 (1998) 295
11. Hong S., Kim E., Kim D.-E., Sung T.-H., and No K. J. Non-Cryst. Solids 221 (1997) 245
12. Contoux G., Cosset F., Celerier A., and Machet J. Thin Solid Films 292 (1997) 75
13. Stanoi D., Socol G., Grigorescu C., Guinnenton F., Monnereau O., Tortet L., Zhang T., and Mihailescu I.N. Mater. Sci. Eng. B 118 (2005) 74
14. Ji A.L., Wang W., Song G.H., Wang Q.M., Sun C., and Wen L.S. Mater. Lett. 58 (2004) 1993
15. Carta G., Natali M., Rossetto G., Zanella P., Salmaso G., Restello S., Rigato V., Kaciulis S., and Mezzi A. Chem. Vap. Depos. 11 (2005) 375
16. Sproul W.D. Vacuum 51 (1998) 641
17. Cheng H., Sun Y., Zhang J.X., Zhang Y.B., Yuan S., and Hing P. J. Cryst. Growth 254 (2003) 46
18. Zhang J.X., Cheng H., Chen Y.Z., Uddin A., Yuan S., Geng S.J., and Zhang S. Surf. Coat. Technol. 198 (2005) 68
19. Guo Q.X., Yoshitugu M., Tanaka T., Nishio M., and Ogawa H. Thin Solid Films 483 (2005) 16
20. Schneider J.M., Sproul W.D., Chia R.W.J., Wong M.S., and Matthews A. Surf. Coat. Technol. 96 (1997) 262
21. Wong M.S., Chia W.J., Yashar P., Schneider J.M., Sproul W.D., and Barnett S.A. Surf. Coat. Technol. 86-87 (1996) 381
22. Barshilia H.C., and Rajam K.S. Surf. Coat. Technol. 201 (2006) 1827
23. Barshilia H.C., Deepthi B., and Rajam K.S. Thin Solid Films 516 (2008) 4168
24. Sellers J. Surf. Coat. Technol. 98 (1998) 1245
25. Barshilia H.C., and Rajam K.S. J. Mater. Res. 19 (2004) 3196
26. Joint Committee on Powder Diffraction Standards, Card # 06-0504.
27. Shen Y.G., Mai Y.W., McKenzieQ D.R., Zhang C., McFall W.D., and McBride W.E. J. Appl. Phys. 88 (2000) 1380
28. Berg R.S., Yu P.Y., and Weber E.R. Appl. Phys. Lett. 47 (1985) 515
29. Shim S.H., Duffy T.S., Jeanloz R., Yoo C.S., and Iota V. Phys. Rev. B 69 (2004) 144107
30. Mougin J., Rosman N., Lucazeau G., and Galerie A. J. Raman Spectrosc. 739 (2001) 32
31. Mougin J., Bihan T.Le., and Lucazeau G. J. Phys. Chem. Solids 62 (2001) 553
32. Brown D.A., Cunningham D., and Glass W.K. Spectrochem. Acta 24 (1968) 965
33. Iliev M.N., Litvinchuk A.P., Lee H.G., and Chu C.W. Phys. Rev. B 60 (1999) 33
34. Yu T., Shen Z.X., He J., Sun W.X., Tang S.H., and Lin J.Y. J. Appl. Phys. 93 (2003) 3951
35. Maurice V., Cadot S., and Marcus P. Surf. Sci. 458 (2000) 195
36. In: Wagner C.D., Riggs W.M., Davis L.E., Moulder J.E., and Muilenberg G.E. (Eds). Handbook of X-ray Photoelectron Spectroscopy (1979), Physical Electronics Division, Perkin-Elmer Corporation, Eden Prairie, MN
37. Musil J., Bardos L., Rajsky A., Vyskocil J., Dolezal B., Loncar G., Dadourek K., and Kubicek V. Thin Solid Films 136 (1986) 229
38. Luo F., Pang X., Gao K., Yang H., and Wang Y. Surf. Coat. Technol. 202 (2008) 3354
39. Hultman L., Helmersson U., Barnett S.A., Sundgren J.E., and Greene J.E. J. Appl. Phys. 61 (1987) 552
40. Barshilia H.C., Prakash M.S., Poojari A., and Rajam K.S. Thin Solid Films 460 (2004) 133
41. Jehn H.A. Surf. Coat. Technol. 125 (2000) 212