ZrAlO ternary oxide as a candidate for high-k dielectrics

Materials Science in Semiconductor Processing

Volumn 9, Issue 6, 2006, Pages 1090-1096

  Bizarro, M ^a   Alonso, J C ^a   Ortiz, A ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

High k dielectrics; Oxides; Pyrosol process

Indexed keywords

CAPACITANCE MEASUREMENT; CURRENT VOLTAGE CHARACTERISTICS; MOS DEVICES; RAPID THERMAL ANNEALING; THIN FILMS; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

ALUMINUM ACETYLACETONATE (ALAAC); HIGH-K DIELECTRICS; PYROSOL PROCESS; ZIRCONIUM ACETYLACETONATE (ZRAAC);

DIELECTRIC MATERIALS;

EID: 33846120568     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2006.10.028     Document Type: Article

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