Elaboration and characterization of Ti and TiN thin films and Ti/TiN multilayers for hard coating applications

Thin Solid Films

Volumn 275, Issue 1-2, 1996, Pages 213-215

  Labdi, S ^a   Houdy, Ph ^a   Psyllaki, P ^b   Jeandin, M ^b  

^a UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

^b PSL RESEARCH UNIVERSITY   (France)

Author keywords

Coatings; Multilayers; Titanium; Titanium nitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; ELLIPSOMETRY; MECHANICAL PROPERTIES; MICROSTRUCTURE; MULTILAYERS; SPUTTERING; THIN FILMS; TITANIUM; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

GRAZING INCIDENCE X RAY REFLECTOMETRY; HIGH VACUUM DIODE RADIO FREQUENCY SPUTTERING; KINETIC ELLIPSOMETRY; TITANIUM NITRIDE THIN FILM; TITANIUM THIN FILM; TITANIUM-TITANIUM NITRIDE MULTILAYERS;

FILM GROWTH;

EID: 0030123750     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)07046-X     Document Type: Article

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