High rate deposition of TiO2 by DC sputtering of the TiO2-X target

Thin Solid Films

Volumn 392, Issue 2, 2001, Pages 169-173

  Ohsaki, Hisashi ^a   Tachibana, Yuko ^a   Mitsui, Akira ^a   Kamiyama, Toshihisa ^a   Hayashi, Yasuo ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

Plasma processing and deposition; Sputtering; Titanium oxide

Indexed keywords

MAGNETRON SPUTTERING; PLASMAS; REFRACTIVE INDEX; SPUTTER DEPOSITION; TITANIUM DIOXIDE;

PLANAR MAGNETRON SPUTTER SYSTEMS;

TARGETS;

EID: 0035974457     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01023-9     Document Type: Conference Paper

References (10)