Deposition of mixed metal oxides by MOCVD and PECVD

Thin Solid Films

Volumn 271, Issue 1-2, 1995, Pages 69-72

  Cao, Zhirong ^a   Owen, John R ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Chemical vapour deposition; Molybdenum oxide; Plasma processing and deposition; Tungsten oxide

Indexed keywords

CRYSTAL STRUCTURE; GLASS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MIXTURES; MOLYBDENUM COMPOUNDS; OXIDES; PLASMA APPLICATIONS; STOICHIOMETRY; TUNGSTEN COMPOUNDS; X RAY CRYSTALLOGRAPHY;

CRYSTALLINITY; MIXED METAL OXIDE; MOLYBDENUM CARBONYLS; MOLYBDENUM OXIDE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TUNGSTEN OXIDE;

THIN FILMS;

EID: 0029487990     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)80084-8     Document Type: Article

References (5)

1. Preparation of amorphous electrochromic tungsten oxide and molybdenum oxide by plasma enhanced chemical vapor deposition