Optical refractive index and static permittivity of mixed Zr-Si oxide thin films prepared by ion beam induced CVD

Thin Solid Films

Volumn 516, Issue 2-4, 2007, Pages 481-485

  Ferrer, F J ^a   Frutos, F ^b   Garcia Lopez J ^a   Gonzalez Elipe A R ^c   Yubero, F ^c  

^a CENTRO NACIONAL DE ACELERADORES   (Spain)

^b UNIVERSITY OF SEVILLE   (Spain)

^c INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

IBICVD; Refractive index; Static permittivity; Thin films; Zr Si oxides

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ION BEAMS; OXIDES; PERMITTIVITY; REFRACTIVE INDEX; SILICON; ZIRCONIUM;

IBICVD; STATIC PERMITTIVITY; ZR-SI OXIDES;

THIN FILMS;

EID: 36148995831     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.139     Document Type: Article

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