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Thin Solid Films

Volumn 394, Issue 1-2, 2001, Pages 80-88

A new class of Ti-Si-C-N coatings obtained by chemical vapor deposition - Part II: Low-temperature process

(2) Kuo, Dong Hau a Huang, Kwon Wen a

a NATIONAL DONG HWA UNIVERSITY (Taiwan)

Author keywords

Chemical vapor deposition; Low temperature; Ti Si C N coatings

Indexed keywords

ABSORPTION; CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; CRYSTAL STRUCTURE; LOW TEMPERATURE OPERATIONS; TITANIUM CARBIDE;

LOW TEMPERATURE PROCESSES;

PROTECTIVE COATINGS;

EID: 0035881912 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/s0040-6090(01)00878-1 Document Type: Article

Times cited : (16)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.