Effect of C2H2 gas flow rate on synthesis and characteristics of Ti-Si-C-N coating by cathodic arc plasma evaporation

Journal of Materials Processing Technology

Volumn 209, Issue 15-16, 2009, Pages 5521-5526

  Chang, Chi Lung ^a   Hsieh, Tsung Ju ^a  

^a MINGDAO UNIVERSITY   (Taiwan)

Author keywords

Acetylene; Cathodic arc plasma evaporation; Diamond like carbon film; Raman; Ti Si C N film; Wear

Indexed keywords

ADHESION STRENGTHS; ALLOY TARGET; CARBON CONTENT; CATHODIC ARC PLASMA EVAPORATION; CO-SUBSTRATE; COMPOSITION ANALYSIS; DEPOSITED COATINGS; FRICTION COEFFICIENTS; GAS FLOWRATE; GAS FLOWS; LOW FRICTION; MIXTURE FLOW; N CONTENT; RAMAN; RAMAN ANALYSIS; SI-C-N FILMS; TI-SI-C-N FILM; TOP COATING; WEAR;

ACETYLENE; AERODYNAMICS; CAVITY RESONATORS; COATINGS; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; ELECTRIC ARCS; EVAPORATION; FLOW OF GASES; FLOW RATE; FRICTION; LIGHTING; MECHANICAL PROPERTIES; METALLIC FILMS; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; OPTICAL SENSORS; PLASMAS; SILICON; SILICON ALLOYS; SUBSTRATES; TITANIUM COMPOUNDS; TRIBOLOGY; TUNGSTEN CARBIDE; VAPORS;

CARBON FILMS;

EID: 67650753569     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2009.05.008     Document Type: Article

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