Investigation of chemical mechanical polishing of zinc oxide thin films

Applied Surface Science

Volumn 257, Issue 13, 2011, Pages 5837-5843

  Gupta, Sushant ^a   Kumar, Purushottam ^b   Chakkaravathi, A Arul ^b   Craciun, Doina ^c   Singh, Rajiv K ^a  

^a University of Florida   (United States)

^b Sinmat Inc   (United States)

^c NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Chemical mechanical polishing; Thin films; Transparent conducting oxide; Zinc oxide

Indexed keywords

CONDUCTIVE FILMS; II-VI SEMICONDUCTORS; POLISHING; SINGLE CRYSTALS; SURFACE ROUGHNESS; THIN FILMS; TRANSPARENT CONDUCTING OXIDES; ZINC OXIDE;

CHEMICAL-MECHANICAL POLISHING PROCESS; DEVICE PERFORMANCE; OPTIMIZED CONDITIONS; POLYCRYSTALLINE THIN FILM; REMOVAL RATE; RMS ROUGHNESS; SMOOTH SURFACE; ZINC OXIDE THIN FILMS;

CHEMICAL MECHANICAL POLISHING;

EID: 79952537716     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.01.116     Document Type: Article

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