Surface planarization of ZnO thin film for optoelectronic applications

Microelectronics Journal

Volumn 40, Issue 2, 2009, Pages 299-302

  Lee, Woo Sun ^a   Choi, Gwon Woo ^a   Seo, Yong Jin ^b  

^a Chosun University   (South Korea)

^b Daebul University   (South Korea)

Author keywords

Chemical mechanical polishing (CMP); Optoelectronics; Surface morphology; Transmittance; Zinc oxide (ZnO)

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; CHEMICAL PROPERTIES; MAGNETRON SPUTTERING; METALLIC FILMS; MORPHOLOGY; NANOTECHNOLOGY; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; POLISHING; SEMICONDUCTING ZINC COMPOUNDS; SOLIDS; SURFACE PROPERTIES; THIN FILMS; ZINC; ZINC OXIDE;

ATOMIC-FORCE MICROSCOPIES; CHEMICAL MECHANICAL POLISHING (CMP); FILM DEPOSITIONS; HIGH TRANSMITTANCES; LOW RESISTIVITIES; OPTO-ELECTRONIC APPLICATIONS; OPTOELECTRONICS; PROCESS PARAMETERS; RADIO FREQUENCIES; SURFACE PLANARIZATION; SURFACE QUALITIES; TRANSMITTANCE; ULTRA VIOLETS; VISIBLE SPECTROMETERS; ZINC OXIDE (ZNO); ZNO THIN FILMS;

SURFACE MORPHOLOGY;

EID: 59049097745     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2008.07.048     Document Type: Article

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