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Journal of Alloys and Compounds

Volumn 509, Issue 14, 2011, Pages 4910-4915

Thermal stability of electrical properties of ZnO:Al films deposited by room temperature magnetron sputtering

(3) Wang, Tao a Diao, Xungang a Ding, Peng a

a BEIHANG UNIVERSITY (China)

Author keywords

AZO film; Magnetron sputtering; Real time sheet resistance; Thermal stability

Indexed keywords

ALLOY TARGET; ALUMINUM-DOPED ZINC OXIDE; ARGON GAS; AZO FILMS; CHANGE-POINTS; CRYSTALLINE STRUCTURE; DIRECT CURRENT; ELECTRICAL PROPERTY; FILM PROPERTIES; HALL MEASUREMENTS; HIGHER TEMPERATURES; REACTIVE MAGNETRON SPUTTERING; REAL-TIME SHEET RESISTANCE; ROOM TEMPERATURE; SODA LIME GLASS; SURFACE CHEMICAL BONDING STATE; THERMAL STABILITY; X RAY PHOTOELECTRON SPECTRA; ZNO; ZNO:AL FILMS;

ALUMINUM; ALUMINUM COATINGS; ANNEALING; ARGON; CARRIER CONCENTRATION; CARRIER MOBILITY; CHEMICAL BONDS; DIFFRACTION; ELECTRIC RESISTANCE; MAGNETRON SPUTTERING; OPTICAL FILMS; OXIDE FILMS; SHEET RESISTANCE; SURFACE STRUCTURE; THERMODYNAMIC STABILITY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ELECTRIC PROPERTIES;

EID: 79952442061 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2011.01.210 Document Type: Article

Times cited : (13)

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