Microstructures, electrical and optical characteristics of ZnO thin films by oxygen plasma-assisted pulsed laser deposition

Journal of Crystal Growth

Volumn 305, Issue 1, 2007, Pages 36-39

  Gu, Yanfei ^a,b   Li, Xiaomin ^a   Yu, Weidong ^a   Gao, Xiangdong ^a   Zhao, Junliang ^a,b   Yang, Chang ^a,b  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

A1. Crystal structure; A1. Electrical properties; A1. Photoluminescence; A1. Raman scattering; A3. Pulsed laser deposition; B1. Zinc oxide

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; RAMAN SCATTERING; THIN FILMS;

FREE-ELECTRON CONCENTRATION; OXYGEN PLASMA-ASSISTED PULSED LASER DEPOSITION;

ZINC OXIDE;

EID: 34249913153     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.03.050     Document Type: Article

References (18)

1. R.F. Service. Science 276 (1997) 895
2. Lim J.-H., Kang C.-K., Kim K.-K., Park I.-K., Hwang D.-K., and Park S.-J. Adv. Mater. 18 (2006) 2720
3. Tsukazaki A., Ohtomo A., Onuma T., Ohtani M., Makino T., Sumiya M., Ohtani K., Chichibu S.F., Fuke S., Segawa Y., Ohno H., Koinuma H., and Kawasaki M. Nat. Mater. 4 (2005) 42
4. Lu C.-Y., Chang S.-J., Chang S.-P., Lee C.-T., Kuo C.-F., Chang H.-M., Chiou Y.-Z., Hsu C.-L., and Chen I.-C. Appl. Phys. Lett. 89 (2006) 153101
5. Pearton S.J., Norton D.P., Ip K., Heo Y.W., and Steiner T. Prog. Mater. Sci. 50 (2005) 293
6. Look D.C., and Claflin B. Phys. Stat. Sol. 241 (2004) 624
7. Tu M.-L., Su Y.-K., and Ma C.-Y. J. Appl. Phys. 100 (2006) 053705
8. Theys B., Sallet V., Jomard F., Lusson A., Rommeluère J.-F., and Teukam Z. J. Appl. Phys. 91 (2002) 3922
9. Sano M., Miyamoto K., Kato H., and Yao T. J. Appl. Phys. 95 (2004) 5527
10. Choopun S., Vispute R.D., Noch W., Balsamo A., Sharma R.P., Venkatesan T., Iliadis A., and Look D.C. Appl. Phys. Lett. 75 (1999) 3947
11. Minegishi K., Koiwai Y., Kikuchi Y., Yano K., Kasuga M., and Shimizu A. Jpn. J. Appl. Phys. 36 (1997) L1453
12. Look D.C., Hemsky J.W., and Sizelove J.R. Phys. Rev. Lett. 82 (1999) 2552
13. Ashkenov N., Mbenkum B.N., Bundesmann C., Riede V., Lorenz M., Spemann D., Kaidashev E.M., Kasic A., Schubert M., Grundmann M., Wagner G., Neumann H., Darakchieva V., Arwin H., and Monemar B. J. Appl. Phys. 93 (2003) 126
14. Kumar B., Gong H., Chow S.Y., Tripathy S., and Hua Y. Appl. Phys. Lett. 89 (2006) 071922
15. Senger R.T., and Bajaj K.K. Phys. Rev. B 68 (2003) 045313
16. Look D.C., Farlow G.C., Reunchan P., Limpijumnong S., Zhang S.B., and Nordlund K. Phys. Rev. Lett. 95 (2005) 225502
17. Chen Z.Q., Yamamoto S., Maekawa M., Kawasuso A., Yuan X.L., and Sekiguch T. J. Appl. Phys. 94 (2003) 4807
18. Matsumoto T., Kato H., Miyamoto K., Sano M., and Zhukov E.A. Appl. Phys. Lett. 81 (2002) 1231