SCOPUS 정보 검색 플랫폼

Volumn 40, Issue 4, 2011, Pages 453-458

In situ interferometry of MOCVD-grown ZnO for nucleation-layer-based optimization and nanostructure formation monitoring

(3) Biethan, J P a Considine, L a Pavlidis, D a

a DARMSTADT UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

in situ interferometry; MOCVD; nanostructures; nucleation layer optimization; ZnO

Indexed keywords

ACCURATE PREDICTION; HIGH-TEMPERATURE GROWTH; IN SITU INTERFEROMETRY; IN-SITU; INTERFEROMETRY TECHNIQUE; MOCVD; MONOCRYSTALLINE; NANOSTRUCTURE FORMATION; NUCLEATION LAYER OPTIMIZATION; NUCLEATION LAYERS; VARIOUS SUBSTRATES; X-RAY DIFFRACTOMETRY; ZNO; ZNO LAYERS;

GALLIUM NITRIDE; INTERFEROMETRY; MORPHOLOGY; NANOSTRUCTURES; NUCLEATION; OPTIMIZATION; SILICON CARBIDE; SURFACE MORPHOLOGY; X RAY DIFFRACTION ANALYSIS;

ZINC OXIDE;

EID: 79952184621 PISSN: 03615235 EISSN: None Source Type: Journal
DOI: 10.1007/s11664-011-1515-2 Document Type: Article

Times cited : (2)

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