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Volumn 12, Issue 6, 2010, Pages 681-687
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Reactive DC magnetron sputter deposited titanium-copper-nitrogen nano-composite thin films with an argon/nitrogen gas mixture
a
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Author keywords
nano composite; reactive magnetron sputtering; Ti doped Cu3N
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Indexed keywords
ABRUPT TRANSITION;
ABSORPTION COEFFICIENTS;
AGGLOMERATED STRUCTURES;
CHEMICAL BONDINGS;
DIRECT CURRENT MAGNETRON SPUTTERING;
ENERGY DISPERSIVE X RAY SPECTROSCOPY;
EXTINCTION COEFFICIENTS;
FACE CENTERED CUBIC STRUCTURE;
FILM MORPHOLOGY;
GLASS SLIDES;
MAGNETRON SPUTTER;
PHASE ANALYSIS;
POTASSIUM BROMIDE;
REACTIVE MAGNETRON SPUTTERING;
RHENIUM OXIDE;
SEM/EDX;
SI (1 1 1);
SPUTTERING POWER;
TI DOPED;
TITANIUM DOPED;
VISIBLE RANGE;
XRD;
ATOMIC SPECTROSCOPY;
BROMINE COMPOUNDS;
CHEMICAL BONDS;
COPPER;
CRYSTAL ATOMIC STRUCTURE;
CRYSTALLITES;
DC POWER TRANSMISSION;
FILM PREPARATION;
FOURIER TRANSFORMS;
GAS MIXTURES;
MAGNETRON SPUTTERING;
NANOCOMPOSITES;
NITROGEN;
POTASSIUM;
REFRACTIVE INDEX;
REVERSE ENGINEERING;
RHENIUM;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SINTERING;
THIN FILMS;
TITANIUM;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
X RAY SPECTROSCOPY;
COMPOSITE FILMS;
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EID: 78651521050
PISSN: 10090630
EISSN: None
Source Type: Journal
DOI: 10.1088/1009-0630/12/6/09 Document Type: Article |
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Times cited : (6)
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References (40)
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