Process simulation of reactive DC magnetron sputtering for thin film deposition of Niobium-Titanium Nitride

IEEE Transactions on Applied Superconductivity

Volumn 15, Issue 2 PART III, 2005, Pages 3520-3523

  Maezawa, Hiroyuki ^a   Sato, Takayuki ^b   Noguchi, Takashi ^c  

^a NAGOYA UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c NATIONAL ASTRONOMICAL OBSERVATORY OF JAPAN   (Japan)

Author keywords

LTC film; Reactive sputter; Simulation

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; NIOBIUM; NITRIDES; OPTIMIZATION; REACTIVE POWER; THIN FILMS; TITANIUM;

BOLTZMANN CONSTANTS; LTC FILMS; REACTIVE SPUTTER;

MAGNETRON SPUTTERING;

EID: 22044442582     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2005.849027     Document Type: Conference Paper

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