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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2394-2399

Co, Ni-base alloy thin films deposited by reactive radio frequency magnetron sputtering

(3) Scardi, P a Dong, Y H a Tosi, C a

a UNIVERSITY OF TRENTO (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; BRITTLENESS; COPPER ALLOYS; CORROSION RESISTANCE; DELAMINATION; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROHARDNESS; PHYSICAL VAPOR DEPOSITION; PLASTICITY; POLYCRYSTALLINE MATERIALS; PROTECTIVE COATINGS; RADIOFREQUENCY SPECTROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; VICKERS HARDNESS TESTING;

BUFFER LAYERS; METASTABLE PHASES;

THIN FILMS;

EID: 0035442780 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1385907 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.