Comparative study of the usefulness of low energy Cs+, Xe +, and O2+ ions for depth profiling amino-acid and sugar films

Analytical Chemistry

Volumn 82, Issue 24, 2010, Pages 10052-10059

  Wehbe, Nimer ^a   Houssiau, Laurent ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CESIUM ATOM; CHARACTERISTIC SIGNAL; COMPARATIVE STUDIES; EFFECT OF OXYGEN; ION BEAM ENERGY; LOW ENERGIES; NON-POLYMERIC; OXYGEN FLOODING; REFERENCE SYSTEMS; SPUTTERING PROCESS; SPUTTERING YIELDS; TREHALOSE MOLECULES;

AMINO ACIDS; CESIUM; DEPTH PROFILING; ION BEAMS; IONS; MOLECULES; OXYGEN; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPUTTERING; SUGAR (SUCROSE); XENON;

CESIUM COMPOUNDS;

AMINO ACID; CARBOHYDRATE; CATION; CESIUM; OXYGEN; PHENYLALANINE; TREHALOSE; XENON;

ARTICLE; COMPARATIVE STUDY;

AMINO ACIDS; CARBOHYDRATES; CATIONS; CESIUM; OXYGEN; PHENYLALANINE; TREHALOSE; XENON;

EID: 78650351244     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac101696c     Document Type: Article

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