Molecular depth profiling of polymers with very low energy reactive ions

Surface and Interface Analysis

Volumn 42, Issue 8, 2010, Pages 1402-1408

  Houssiau, L ^a   Mine, N ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Caesium; Cross linking reactions; Cs+; Depth profiles; Ion irradiation; Poly (methyl methacrylate); Polycarbonate; Polymers; Polystyrene; SIMS; Sputtering yields; ToF; Xenon; XPS

Indexed keywords

CAESIUM; CROSSLINKING REACTION; CS+; DEPTH PROFILE; ION IRRADIATION; SIMS; SPUTTERING YIELDS; TOF; XPS;

CARBIDES; CESIUM; CESIUM COMPOUNDS; DEPOLYMERIZATION; ESTERS; IRRADIATION; NEGATIVE IONS; PHOTODEGRADATION; POLYMERS; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY; XENON;

DEPTH PROFILING;

EID: 77956509360     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3159     Document Type: Article

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