Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams

Rapid Communications in Mass Spectrometry

Volumn 23, Issue 11, 2009, Pages 1601-1606

  Ninomiya, Satoshi ^a   Ichiki, Kazuya ^a   Yamada, Hideaki ^a   Nakata, Yoshihiko ^a   Seki, Toshio ^a,b   Aoki, Takaaki ^a,b   Matsuo, Jiro ^a,b  

^a KYOTO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH PROFILING; ION BEAMS; ION SOURCES; IONS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING FILMS;

ARGON CLUSTERS; ATOMIC IONS; CLUSTER ION BEAMS; INCIDENT IONS; ION FLUENCES; MOLECULAR ION YIELD; ORGANIC MATERIALS; POLYMER MATERIALS; PRIMARY IONS; SECONDARY ION-MASS SPECTROMETRY;

POLYMER FILMS;

EID: 66149160254     PISSN: 09514198     EISSN: 10970231     Source Type: Journal    
DOI: 10.1002/rcm.4046     Document Type: Article

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