Enhancement of the positive secondary ion yield during low-energy, dual-beam depth profiling of polytetrafluoroethylene with 1-keV Cs+

Surface and Interface Analysis

Volumn 37, Issue 9, 2005, Pages 743-748

  Francis, J T ^a   McIntyre, N S ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

Polydimethylsiloxane; Polyethylene terephthalate; Polytetrafluoroethylene; PTFE; Static limit; TOF SIMS

Indexed keywords

DOSIMETRY; FLUOROCARBONS; HEAVY IONS; POLYETHYLENE TEREPHTHALATES; POLYTETRAFLUOROETHYLENES; POSITIVE IONS; SILICONES;

CHEMICAL INTERACTION; DUAL-BEAM DEPTH PROFILING; ION SPECIES; STATIC LIMITS;

SURFACE CHEMISTRY;

EID: 24944531380     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.2073     Document Type: Article

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