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Volumn 1210, Issue , 2010, Pages 257-262

ToF-SIMS study of pulsed laser melting energy density on Ti implanted Si for intermediate band

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENT EFFECTS; ENERGY DENSITY; HIGH DOSE; IMPLANTED LAYERS; IMPURITY PROFILE; INTERMEDIATE BANDS; LASER MELTING; MAXIMUM PEAKS; PULSED LASER; TOF SIMS;

EID: 78650339286     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (31)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.