Observation of explosive crystallization during excimer laser annealing using in situ time-resolved optical reflection and transmission measurements

Journal of Materials Processing Technology

Volumn 209, Issue 6, 2009, Pages 2978-2985

  Kuo, Chil Chyuan ^a  

^a MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Crystallization mechanism; Excimer laser annealing; Explosive crystallization; In situ time resolved optical reflection and transmission measurement

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CRYSTALLIZATION; EXCIMER LASERS; EXPLOSIVES; GAS LASERS; HELIUM; NEON; PULSED LASER APPLICATIONS; REFLECTION; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SURFACE ROUGHNESS;

ATOMIC FORCES; CONTINUOUS WAVES; CRYSTALLIZATION MECHANISM; EXCIMER; EXCIMER LASER ANNEALING; EXPLOSIVE CRYSTALLIZATION; GLASS SUBSTRATES; GRAIN SIZES; IN SITU TIME-RESOLVED OPTICAL REFLECTION AND TRANSMISSION MEASUREMENT; LASER FLUENCES; MELT DURATIONS; PROBE LASERS; PULSE DURATIONS; RECRYSTALLIZATION; REFLECTION AND TRANSMISSIONS; TIME RESOLUTIONS;

AMORPHOUS SILICON;

EID: 61349181762     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.07.003     Document Type: Article

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