Interface growth mechanism in ion beam sputtering-deposited Mo/Si multilayers

Philosophical Magazine

Volumn 86, Issue 19, 2006, Pages 2865-2879

  Largeron, C ^a   Quesnel, E ^a   Thibault, J ^b  

^a CEA LETI   (France)

^b AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ION BEAM ASSISTED DEPOSITION; MICROELECTRONICS; MOLYBDENUM; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

INTERFACE GROWTH; ION BEAM SPUTTERING; MULTILAYER STRUCTURES;

MULTILAYERS;

EID: 33646897372     PISSN: 14786435     EISSN: 14786443     Source Type: Journal    
DOI: 10.1080/14786430600640502     Document Type: Article

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