Interlayer transition zones in Mo/Si superlattices

Journal of Applied Physics

Volumn 92, Issue 3, 2002, Pages 1216-1220

  Yulin, S ^a   Feigl, T ^a   Kuhlmann, T ^a   Kaiser, N ^a   Fedorenko, A I ^b   Kondratenko, V V ^b   Poltseva, O V ^b   Sevryukova, V A ^b   Zolotaryov, A Yu ^b   Zubarev, E N ^b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b NATIONAL TECHNICAL UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

BULK DIFFUSIONS; CRYSTALLINE STRUCTURE; FORMATION MECHANISM; GRAZING INCIDENCE; INTERFACE EFFECT; MO/SI MULTILAYER; REFLECTIVITY MEASUREMENTS; SI ATOMS; TRANSITION ZONES;

ELECTRON MICROSCOPY; MOLYBDENUM; MULTILAYERS;

SILICON;

EID: 0036678932     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1487919     Document Type: Article

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