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Volumn 406, Issue 2, 2011, Pages 211-215

FTIR and spectroscopic ellipsometry investigations of the electron beam evaporated silicon oxynitride thin films

Author keywords

FTIR; Optical constants; Silicon oxynitride; Spectroscopic ellipsometry

Indexed keywords

ABSORPTION BAND; ABSORPTION COEFFICIENTS; BRUGGEMAN EFFECTIVE MEDIUM APPROXIMATION; CAUCHY MODEL; ELLIPSOMETRIC SPECTRA; EVAPORATED SILICON; EXTINCTION COEFFICIENTS; FTIR; INTERFACE LAYER; SILICON OXYNITRIDE; SPECTROSCOPIC ELLIPSOMETERS; SURFACE LAYERS; THREE-LAYER; URBACH ENERGY;

EID: 78649522119     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2010.10.045     Document Type: Article
Times cited : (7)

References (33)
  • 27
    • 0004150815 scopus 로고    scopus 로고
    • K. Tanaka, E. Maruyama, T. Shimada, H. Okamoto, T. Sato, John Wiley & Sons Ltd Chichester
    • K. Tanaka, E. Maruyama, T. Shimada, H. Okamoto, T. Sato, Amorphous Silicon 1999 John Wiley & Sons Ltd Chichester
    • (1999) Amorphous Silicon


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.