Influence of film structure on gas barrier properties of SiOxNy films

Surface and Coatings Technology

Volumn 205, Issue 1, 2010, Pages 168-173

  Yonekura, Daisuke ^a   Fujikawa, Katsuhiro ^a   Murakami, Ri Ichi ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Gas barrier property; Oxygen transmission rate; Si O N network; SiOxNy film; Sputtering

Indexed keywords

AFM OBSERVATION; DC MAGNETRON SPUTTERING; DEPOSITION PROCESS; FILM DENSITY; FILM SPUTTERING; FILM STRUCTURE; FTIR ANALYSIS; GAS BARRIER; GAS BARRIER PROPERTIES; HIGH-NITROGEN; HYDROGEN TERMINATION; LOCAL STRUCTURE; MACRODEFECTS; NITROGEN GAS FLOW; OXYGEN TRANSMISSION RATES; PET SUBSTRATE; RANDOM BONDING MODEL; SEM;

AERODYNAMICS; DC POWER TRANSMISSION; FLOW OF GASES; MORPHOLOGY; NITROGEN; OXYGEN; OXYGEN PERMEABLE MEMBRANES; PLASMAS; REFRACTIVE INDEX; SILICON; SILICON COMPOUNDS; SURFACE DEFECTS; SURFACE MORPHOLOGY;

GASES;

EID: 77954957690     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.06.024     Document Type: Article

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