SiO x N y thin films with variable refraction index: Microstructural, chemical and mechanical properties

Applied Surface Science

Volumn 256, Issue 14, 2010, Pages 4548-4553

  Godinho, V ^a,b   Haro, M C Jiménez de ^a   Garcia Lopez J ^c   Goossens, V ^d   Terryn, H ^d   Delplancke Ogletree, M P ^b   Fernandez, A ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^c CENTRO NACIONAL DE ACELERADORES   (Spain)

^d VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

Author keywords

Nano voids; Nanoindentation; Nanostructured coatings; Silicon oxynitride; Tailored refraction index

Indexed keywords

AMORPHOUS FILMS; CHEMICAL STABILITY; COATINGS; ELASTIC MODULI; MECHANICAL PROPERTIES; MECHANICAL STABILITY; NANOINDENTATION; NITRIDES; POROSITY; REFRACTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILICON NITRIDE; THIN FILMS;

HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; NANO-VOIDS; NANOSTRUCTURED COATINGS; REACTIVE MAGNETRON SPUTTERING; REFRACTION INDEX; RUTHERFORD BACK-SCATTERING; SILICON OXYNITRIDES; THERMAL AND MECHANICAL STABILITIES;

AMORPHOUS SILICON;

EID: 77950594200     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.045     Document Type: Article

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