Silicon rich silicon oxynitride films for photoluminescence applications

Thin Solid Films

Volumn 426, Issue 1-2, 2003, Pages 200-204

  Ribeiro, M ^a   Pereyra, I ^a   Alayo, M I ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Dielectrics; Optical properties; Plasma processing and deposition; Silicon oxide

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAPID THERMAL ANNEALING; SILICON;

EMISSION INTENSITY;

THIN FILMS;

EID: 0037463268     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00008-7     Document Type: Article

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