Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition

Surface and Coatings Technology

Volumn 202, Issue 13, 2008, Pages 2844-2849

  Shim, Juno ^a   Yoon, Ho Gyu ^a   Na, Sang Hyun ^c   Kim, Insun ^b   Kwak, Soonjong ^c  

^a Korea University   (South Korea)

^b R and D Institute   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

Author keywords

Flexible display; Gas barrier; Plastic substrate; Poly(ether sulfone); Silicon oxynitride; Undercoat

Indexed keywords

CRACK INITIATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSULFONES; SILICON COMPOUNDS; STRUCTURE (COMPOSITION);

GAS BARRIER COATINGS; HEXAMETHYLDISILOXANE; SILICON OXYNITRIDE; UNDERCOAT;

PROTECTIVE COATINGS;

CRACK INITIATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSULFONES; PROTECTIVE COATINGS; SILICON COMPOUNDS; STRUCTURE (COMPOSITION);

EID: 44249123820     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.10.020     Document Type: Article

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