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Volumn 20, Issue 44, 2010, Pages 9995-10000

Atomic layer deposition of CaB2O4 films using bis(tris(pyrazolyl)borate)calcium as a highly thermally stable boron and calcium source

(3) Saly, Mark J a Munnik, Frans b Winter, Charles H a

a WAYNE STATE UNIVERSITY (United States)

b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALD GROWTH; AS-DEPOSITED FILMS; CARBON AND NITROGEN; DETECTION LIMITS; ELASTIC RECOIL DETECTION ANALYSIS; HYDROGEN CONCENTRATION; NON-VOLATILE; SCANNING ELECTRON MICROGRAPHS; SELF-LIMITED; THERMAL DECOMPOSITIONS; THERMALLY STABLE; THIN FILM COMPOSITION; TRISPYRAZOLYLBORATE; WATER PULSE; XPS ANALYSIS;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; BORON; BORON COMPOUNDS; CALCIUM; PYROLYSIS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMS;

EID: 78049413945 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c0jm02280b Document Type: Article

Times cited : (19)

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